Principles
and Techniques of Transmission Electron Microscopy
BOT/MBIO/ZOO 5364 – Tentative Syllabus – Fall
2009
Samuel Roberts Noble Electron Microscopy Web site: http://www.microscopy.ou.edu/
SRNEML Laboratory Phone: 325-4391
D2L Class Website:
Instructors:
Scott Russell, GLC Professor, and Director Office: 210 NML e-mail: srussell@ou.edu
Preston Larson, Research Scientist Office: 205E NML e-mail: plarson@ou.edu
Greg Strout, Electron Microscopist Office: 214 NML e-mail: gstrout@ou.edu
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Lecture: MWF 8:30-9:20 am
Laboratory: TBD, TEM: TBD
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Textbooks for
Reference:
Materials: D. B.
Williams and C. B. Carter, “Transmission Electron Microscopy: A Textbook for Material Scientists”, (1996),
Plenum Press,
Biologicals: J. J. Bozzola
and L. D. Russell, “Electron Microscopy:
Principles and Techniques for Biologists”, 2nd ed. (1999),
Jones & Bartlett,
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Tentative
Course Schedule
|
Week |
Date |
Lecture |
|
Week 1 |
Aug. 24 |
Course content,
requirements, grading, lab rules, lab tour, Intro to Electron Microscopy (SR) |
|
Aug. 26 |
Instrument, Gun, and Optical Principles (SR) |
|
|
Aug. 28 |
Instrument, Gun, and Optical Principles (SR) |
|
|
Week 2 |
Aug. 31 |
Vacuum Systems (PL) |
|
Sep. 2 |
Vacuum Systems (PL) |
|
|
Sep. 4 |
Electron Beam Sources (PL) |
|
|
Week 3 |
Sep. 7 |
Labor Day |
|
Sep. 9 |
Electron Beam Sources (PL) |
|
|
Sep. 11 |
Electromagnetic Lenses (SR) |
|
|
Week 4 |
Sep. 14 |
Beam Specimen Interactions (PL) |
|
Sep. 16 |
TEM Imaging Modes: Imaging Principles, Resolution, Ray Paths (PL) |
|
|
Sep. 18 |
TEM Imaging Modes: Diffraction, Bright Field, Dark Field, STEM, HAADF (PL) |
|
|
Week 5 |
Sep. 21 |
Materials Specimen Preparation (PL) |
|
Sep. 23 |
Individual Class Projects |
|
|
Sep. 25 |
Life Sciences Prep / Ultramicrotomy (SR) |
|
|
Week 6 |
Sep. 28 |
Exam 1 |
|
Sep. 30 |
Support Film, Replicas, Shadow Casting (SR) |
|
|
Oct. 2 |
Freezing Technologies/Freeze Fracture (SR) |
|
|
Week 7 |
Oct. 5 |
Demo: Support Films (GS) |
|
Oct. 7 |
Demo: Digital Imaging (GS) |
|
|
Oct. 9 |
End Fracture/Cryoultramicrotomy (SR) |
|
|
Week 8 |
Oct. 12 |
Energy Dispersive Spectroscopy (PL) |
|
Oct. 14 |
Qualitative and Quantitative EDS Analysis (PL) |
|
|
Oct. 16 |
|
|
|
Week 9 |
Oct. 19 |
Electron Energy Loss Spectroscopy (PL) |
|
Oct. 21 |
High Resolution TEM (PL) |
|
|
Oct. 23 |
High Voltage EM (SR) |
|
|
Week 10 |
Oct. 26 |
Image Interpretation and Artifacts (SR) |
|
Oct. 28 |
Quantitative Microscopic Analysis and Stereological Methods (SR) |
|
|
Oct. 30 |
Exam 2 |
|
|
Weeks 11-16 |
Nov. 2-Dec 11 |
Poster Making / |
Fall 2009 Academic
Calendar:
http://www.ou.edu/admissions/home/academic_calendar/fall_2009.html
Final Examination
Schedule and Rules:
http://www.ou.edu/enrollment/home/final_exams/fall_semester_final0.html
FINAL
PROJECTS
Projects are presented in lieu of a final examination. All projects are due at the final:
10:30 AM on Monday,
December 14th, 2009
Briefly, the project involves:
STIGMATION
MICROGRAPHS
Final stigmation/focus series photographs are due on or before December 11th. Up to three sets of stigmation/focus series images may be turned in and only the highest grade will count. The first set will be due on October 31st with the final set due on or before December 11th. The stigmation micrographs consist of:
EQUIPMENT CHECK-OUT
Zeiss 10: Checkouts begin on October 12th
Check-outs may include both a written and oral/hands-on component. The length of an individual student’s checkout is variable depending on their knowledge of the microscope, principles of electron microscopy and operational skill, but plan on allotting around 4-6 hours. Checkouts on both TEMs will consist of the following parts:
If a need exists for you to use the JEOL 2000FX (e.g. higher resolution), consult the instructor to discuss the possibility of training on this machine. Training on the JEOL 2000FX will be based on research needs, competence (partly based on the Zeiss 10 checkouts), time constraints, and the discretion of EML personnel.
JEOL 2000FX: Checkouts will be conducted at the discretion of EML personnel.
Other Equipment: Supervised operation until competent.
User’s List: A list of users of EML equipment and the instruments they are qualified to use is maintained by the lab. DO NOT USE any equipment on which you have not been checked out. Only EML personnel are to train individuals on the use of EML equipment.
Note: It is recommended that you begin working on your project prior to completing your checkout.
Online schedule. The sign-up and schedule for the Zeiss 10 and JEOL 2000 is located online at:
http://www.microscopy.ou.edu/schedule/index.cgi
You will be entered into the system when you become knowledgeable and independent enough to use the microscope without EM personnel present. Consult EML personnel before scheduling equipment use.
GRADING
Grading in the course will be broken down as follows:
Exam 1 20%
Exam 2 20%
Stig Series 10%
Checkouts 20%
Final Project/Poster
Presentation 30%
Total 100%
POLICY
All OU students are governed by
the policies of the
All of these stated policies are incorporated into this syllabus by this reference. It is ultimately the student’s responsibility to be aware of current and changing policies over the course of their academic career. All participants in the course are bound by these policies.